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Plasma Chemistry and Plasma Processing

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JOURNAL INFORMATION
Publisher Springer New York
Open Access NO
Quartile Q2
Citation Count 911
P-ISSN 0272-4324
E-ISSN 1572-8986
Categories Chemical Engineering (miscellaneous), Chemistry (miscellaneous), Condensed Matter Physics, Surfaces, Coatings and Films
Area Chemical Engineering, Chemistry, Materials Science, Physics and Astronomy
Region Northern America
Country United States
Summary

  1. Plasma Chemistry and Plasma Processing is published by Springer New York
  2. It is not an oppen access journal
  3. The Subject Area : Chemical Engineering; Chemistry; Materials Science; Physics and Astronomy